ULTIMATE ANALYSIS METHOD

• Main Author: NIKAWA HIDEO
• Format: Patent
• Language: English
• Published: 03.07.1991
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

PURPOSE:To make the structure of an apparatus simple and achieve ultimate analysis to easily analyze a film to be analyzed by measuring infrared ray absorption of the film to be analyzed computing an absorption peak of a specified infrared by and carrying out elemental analysis based on a shifted volume of the infrared ray absorption peak. CONSTITUTION:A silicon nitride film is used as a film 1 to be analyzed and mixed quantity of oxygen is analyzed by using the oxygen contained in the film 1 to be analyzed as an object of analysis. When infrared ray 7 is radiated to the film 1 to be analyzed from a light source 2, a light component having the same frequency as the vibration frequency of molecules composing the film 1 to be analyzed is absorbed and infrared ray 7 radiated from the light source 2 to the film 1 to be analyzed through one side spherical mirror 3a and infrared ray 7 radiated from the light source 2 through the other side spherical mirror 3b without passing the film 1 to be analyzed are led to a spectroscope 6 through a slit 5. The components of the infrared ray 7 are compared with each other by the spectroscope 6 and thus a molecule (oxygen) contained in the film 1 to be analyzed is identified. In this way, the structure of the apparatus is simplified and ultimate analysis method to analyze easily is established.