PATTERN FORMING METHOD

• Main Authors: SAITOU HIROYA, YAMAGUCHI HIROSHI, OKUDAIRA HIROAKI
• Format: Patent
• Language: English
• Published: 26.04.1991
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE:To eliminate the need for conductive films and to prevent the degradation in the S/N of a pattern at the time of exposing by boring a hole in a protective film by a focusing energy beam and depositing a metallic film by an electroless plating method into the hole, thereby correcting the defe...