MANUFACTURE OF NONLINEAR RESISTANCE ELEMENT

• Main Authors: MOTTE SHUNICHI, YAMAZAKI TSUNEO
• Format: Patent
• Language: English
• Published: 05.01.1990
• Subjects: BASIC ELECTRIC ELEMENTS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PURPOSE:To suppress the generation of a picture element defect and to improve the yield by removing a picture element electrode exposed in a pinhole after a nonlinear resistance film is laminated. CONSTITUTION:The pin hole 5 is formed possibly owing to dust, etc., when the nonlinear resistance film 3 is formed. A substrate 1 is dipped in an etchant for etching the picture element electrode 2, and the area of the picture element electrode 2 below the pinhole 5 is etched. Then the nonlinear resistance film 3 is patterned in a desired shape, a metallic film 4 of Cr.Al, etc., is laminated by sputtering, and a row or column electrode is formed by patterning. Consequently, even if the metallic film 4 reaches the substrate 1 through the pinhole 5, it is prevented from being short-circuited to the picture element electrode 2, the defect caused by the pinhole is suppressed, and the process yield is improved.