MATERIAL FOR PHOTO-DECOLORABLE LAYER FOR INCREASING CONTRAST AND PATTERN FORMING METHOD USING SAME

• Main Authors: TO YOICHI, YAMASHITA YOSHIO, JINBO HIDEYUKI, KOSUGE YUJI, UMEHARA HIROSHI, ASANO TAKATERU
• Format: Patent
• Language: English
• Published: 26.12.1990
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE:To make it possible to directly coat a resist film with a coating soln. and to enable direct development by using a compd. having conjugated triene structure and soluble in a slightly polar org. solvent as coloring matter vanishing its color under light and a compd. transparent in a wavelength region of KrF excimer laser beams and soluble in the org. solvent and an aq. alkali soln. as a film forming component. CONSTITUTION:A compd. having conjugated triene structure and soluble in a slightly polar org. solvent is used as coloring component vanishing its color under light and a compd. transparent in a wavelength region of at least KrF excimer laser beams and soluble in the org. solvent and an aq. alkali soln. is used as a film forming component. Even when a resist film is directly coated with a coating soln. of a material for a photo-decolorable layer contg. the compds., the resist film is not damaged by the coating soln. and a pattern can easily be formed with a developing soln. for the resist film.