JPH0224764B

PURPOSE:To improve the resistance to poisoning by impure gas by coating the surfaces of particles of a hydrogen occluding alloy with thin films of Pd, Cu or Ni permeable selectively to only hydrogen. CONSTITUTION:The surfaces of particles of a hydrogen occluding alloy represented by formula I (where...

Full description

Saved in:
Bibliographic Details
Main Authors OOSUMI YASUAKI, YOSHIDA HIROSHI, EBATO KAZUO, TAMURA KEIJI
Format Patent
LanguageEnglish
Published 30.05.1990
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:PURPOSE:To improve the resistance to poisoning by impure gas by coating the surfaces of particles of a hydrogen occluding alloy with thin films of Pd, Cu or Ni permeable selectively to only hydrogen. CONSTITUTION:The surfaces of particles of a hydrogen occluding alloy represented by formula I (where A is Nb, a rare earth element or the like, k<=0.3, l<=0.3, m>=0.1 and k>m), formula II (where l<1 and k>m in case of l=0.5-0.99), formula III (where D is Zr or V, 0<n<=0.1 and k>n), formula IV, V or VI (where A is Ti, Nb or Mo, 0.4<=x<=1.0, 0<=y<=0.6, k=l+m and 0.2<=k<=0.3), formula VII (where A is Co, Cu or the like, 0.8<=k<=1.4, 0<l<2, 0<m<2, 0<n<=0.2 and 2<=2-l+m+n<=2.2), formula VIII (where 0.5<x<1.5 and 0<y<1) or formula IX (where 0<z<1 and y+z<=1) are coated with thin films of Pd, Cu or Ni to obtain the titled bydrogen occluding and releasing material.
Bibliography:Application Number: JP19850163945