METHOD FOR REFINING GASEOUS HYDRIDE

PURPOSE:To efficiently remove the oxygen contained in a gaseous hydride down to an extremely low concn. by bringing the crude gaseous hydride into contact with the silicide of nickel. CONSTITUTION:The crude gaseous hydride is brought into contact with the silicide of the nickel to remove the oxygen...

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Bibliographic Details
Main Authors KITAHARA KOICHI, IWATA KEIICHI, SHIMADA TAKASHI
Format Patent
LanguageEnglish
Published 24.07.1990
Subjects
CHEMISTRY
COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TRANSPORTING
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Summary:PURPOSE:To efficiently remove the oxygen contained in a gaseous hydride down to an extremely low concn. by bringing the crude gaseous hydride into contact with the silicide of nickel. CONSTITUTION:The crude gaseous hydride is brought into contact with the silicide of the nickel to remove the oxygen incorporated into the crude gaseous hydride. The concn. of the oxygen in the gaseous hydride is lowered down to <=0.01ppm, further to about <=0.001ppm by the above mentioned method. The gaseous hydride is exemplified by phosphine, hydrogen selenide, silane, and diborane, etc. The silicide of the nickel is exemplified by nickel silicide, such as Ni3Si, Ni2Si, Ni3Si2, and Ni2Si3 and the nickel to which silicon is combined in various other forms. A method for bringing, for example, silane, into contact with nickel is utilized as a sample method in order to obtain the silicide of the nickel.
Bibliography:Application Number: JP19890004750