MANUFACTURE OF TARGET MATERIAL

• Main Authors: MASHIMA MUNETAKA, FUKUI SOICHI
• Format: Patent
• Language: English
• Published: 02.07.1990
• Subjects: ALLOYS; CASTING; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; FERROUS OR NON-FERROUS ALLOYS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MAKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; METALLURGY; PERFORMING OPERATIONS; POWDER METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING; TREATMENT OF ALLOYS OR NON-FERROUS METALS; WORKING METALLIC POWDER

PURPOSE:To improve the productivity of a target material by carrying out target-manufacturing stages under a nonoxidizing environment, mixing powders while specifying the grain size distribution of the powders, and subjecting the resulting powder mixture to compacting and sintering by a hot pressing method. CONSTITUTION:Tellurium, Tellurium alloy, selenium, and selenium alloy are crushed, screened, and mixed, and further, the resulting powder mixture is compacted and sintered so as to be formed into a target material. The above stages are carried out under a nonoxidizing environment. At the same time, the powders are mixed while regulating grain size distribution so that grains of 60-100 mesh, 100-200 mesh, 200-400 mesh, and <=400 mesh are 40+ or -10wt.%, 30+ or -10wt.%, 20+ or -5wt.%, and 10+ or -5wt.%, respectively, to which compacting and sintering are applied by a hot pressing method. By this method, the resulting sintered compact can be made high-density.