THIN FILM TRANSISTOR

PURPOSE:To shift threshold value in the positive direction without deteriorating a rising the characteristic by having structure, where a first metal film is opposing to a second metal film connected to a gate insulating film through an interlayer insulating film. CONSTITUTION:A gate electrode G is...

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Main Authors MATSUMOTO TOMOTAKA, MISHIMA YASUYOSHI, KIMURA TADAYUKI, OKI KENICHI
Format Patent
LanguageEnglish
Published 25.06.1990
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Abstract PURPOSE:To shift threshold value in the positive direction without deteriorating a rising the characteristic by having structure, where a first metal film is opposing to a second metal film connected to a gate insulating film through an interlayer insulating film. CONSTITUTION:A gate electrode G is made of a MIM(metal-insulator-metal) construction, where an interlayer insulating film 5 is interposed between a first metal layer 3 and a second metal layer 4. Then, the gate electrode G is led out outside as an electrode to impress gate voltage on the first metal film 3, while the second metal 4 is made to oppose to an operating semiconductor layer 7 through a a gate insulating film 6. In this constitution, when gate voltage Vc is impressed on the first metal film 3 from outside, the second metal film 4 works as a true gate electrode and this potential becomes true gate voltage VGO. Thereby, threshold value can be shifted in the positive direction without deteriorating a rising characteristic.
AbstractList PURPOSE:To shift threshold value in the positive direction without deteriorating a rising the characteristic by having structure, where a first metal film is opposing to a second metal film connected to a gate insulating film through an interlayer insulating film. CONSTITUTION:A gate electrode G is made of a MIM(metal-insulator-metal) construction, where an interlayer insulating film 5 is interposed between a first metal layer 3 and a second metal layer 4. Then, the gate electrode G is led out outside as an electrode to impress gate voltage on the first metal film 3, while the second metal 4 is made to oppose to an operating semiconductor layer 7 through a a gate insulating film 6. In this constitution, when gate voltage Vc is impressed on the first metal film 3 from outside, the second metal film 4 works as a true gate electrode and this potential becomes true gate voltage VGO. Thereby, threshold value can be shifted in the positive direction without deteriorating a rising characteristic.
Author KIMURA TADAYUKI
MISHIMA YASUYOSHI
OKI KENICHI
MATSUMOTO TOMOTAKA
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  year: 1990
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Snippet PURPOSE:To shift threshold value in the positive direction without deteriorating a rising the characteristic by having structure, where a first metal film is...
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SubjectTerms BASIC ELECTRIC ELEMENTS
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FREQUENCY-CHANGING
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL LOGIC ELEMENTS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
Title THIN FILM TRANSISTOR
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