THIN FILM TRANSISTOR
PURPOSE:To shift threshold value in the positive direction without deteriorating a rising the characteristic by having structure, where a first metal film is opposing to a second metal film connected to a gate insulating film through an interlayer insulating film. CONSTITUTION:A gate electrode G is...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
25.06.1990
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Subjects | |
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Abstract | PURPOSE:To shift threshold value in the positive direction without deteriorating a rising the characteristic by having structure, where a first metal film is opposing to a second metal film connected to a gate insulating film through an interlayer insulating film. CONSTITUTION:A gate electrode G is made of a MIM(metal-insulator-metal) construction, where an interlayer insulating film 5 is interposed between a first metal layer 3 and a second metal layer 4. Then, the gate electrode G is led out outside as an electrode to impress gate voltage on the first metal film 3, while the second metal 4 is made to oppose to an operating semiconductor layer 7 through a a gate insulating film 6. In this constitution, when gate voltage Vc is impressed on the first metal film 3 from outside, the second metal film 4 works as a true gate electrode and this potential becomes true gate voltage VGO. Thereby, threshold value can be shifted in the positive direction without deteriorating a rising characteristic. |
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AbstractList | PURPOSE:To shift threshold value in the positive direction without deteriorating a rising the characteristic by having structure, where a first metal film is opposing to a second metal film connected to a gate insulating film through an interlayer insulating film. CONSTITUTION:A gate electrode G is made of a MIM(metal-insulator-metal) construction, where an interlayer insulating film 5 is interposed between a first metal layer 3 and a second metal layer 4. Then, the gate electrode G is led out outside as an electrode to impress gate voltage on the first metal film 3, while the second metal 4 is made to oppose to an operating semiconductor layer 7 through a a gate insulating film 6. In this constitution, when gate voltage Vc is impressed on the first metal film 3 from outside, the second metal film 4 works as a true gate electrode and this potential becomes true gate voltage VGO. Thereby, threshold value can be shifted in the positive direction without deteriorating a rising characteristic. |
Author | KIMURA TADAYUKI MISHIMA YASUYOSHI OKI KENICHI MATSUMOTO TOMOTAKA |
Author_xml | – fullname: MATSUMOTO TOMOTAKA – fullname: MISHIMA YASUYOSHI – fullname: KIMURA TADAYUKI – fullname: OKI KENICHI |
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Notes | Application Number: JP19880321297 |
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Snippet | PURPOSE:To shift threshold value in the positive direction without deteriorating a rising the characteristic by having structure, where a first metal film is... |
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SubjectTerms | BASIC ELECTRIC ELEMENTS DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF |
Title | THIN FILM TRANSISTOR |
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