THIN FILM TRANSISTOR

PURPOSE:To shift threshold value in the positive direction without deteriorating a rising the characteristic by having structure, where a first metal film is opposing to a second metal film connected to a gate insulating film through an interlayer insulating film. CONSTITUTION:A gate electrode G is...

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Bibliographic Details
Main Authors MATSUMOTO TOMOTAKA, MISHIMA YASUYOSHI, KIMURA TADAYUKI, OKI KENICHI
Format Patent
LanguageEnglish
Published 25.06.1990
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Summary:PURPOSE:To shift threshold value in the positive direction without deteriorating a rising the characteristic by having structure, where a first metal film is opposing to a second metal film connected to a gate insulating film through an interlayer insulating film. CONSTITUTION:A gate electrode G is made of a MIM(metal-insulator-metal) construction, where an interlayer insulating film 5 is interposed between a first metal layer 3 and a second metal layer 4. Then, the gate electrode G is led out outside as an electrode to impress gate voltage on the first metal film 3, while the second metal 4 is made to oppose to an operating semiconductor layer 7 through a a gate insulating film 6. In this constitution, when gate voltage Vc is impressed on the first metal film 3 from outside, the second metal film 4 works as a true gate electrode and this potential becomes true gate voltage VGO. Thereby, threshold value can be shifted in the positive direction without deteriorating a rising characteristic.
Bibliography:Application Number: JP19880321297