PRODUCTION OF SUBSTRATE FOR PLATED CIRCUIT FORMATION AND PRODUCTION OF WIRING BOARD USING SAID SUBSTRATE
PURPOSE:To enable a film metallic film to be formed by forming a phase of high SiO2 content on a glass surface containing SiO2. CONSTITUTION:A glass surface containing SiO2 is coated with a phase-splitting component capable of forming split-phase glass by reaction with the SiO2 in a glass plate (e.g...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
21.12.1989
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Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE:To enable a film metallic film to be formed by forming a phase of high SiO2 content on a glass surface containing SiO2. CONSTITUTION:A glass surface containing SiO2 is coated with a phase-splitting component capable of forming split-phase glass by reaction with the SiO2 in a glass plate (e.g., an aqueous solution containing NaHCO3 and B2O3) followed by drying and heat treatment to make a reaction between SiO2 and the phase- splitting component to effect phase splitting into a phase of greater SiO2 content and a second phase of lower SiO2 content. Thence, the resultant glass substrate is dipped into water or a dilute acid to remove the latter phase, thus obtaining the objective substrate. A conductor circuit is then plated on this substrate. |
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Bibliography: | Application Number: JP19880125169 |