EXPOSURE LIGHTING DEVICE

• Main Author: FURUTA KATSUMI
• Format: Patent
• Language: English
• Published: 07.09.1989
• Subjects: ACCESSORIES THEREFOR; APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; PHOTOGRAPHY; PHYSICS

PURPOSE:To efficiently detect by superheat preventing detection and to improve reliability by providing a first temperature detecting means which detects the temperature of a light source part and a second temperature detecting means which detects the ambient environmental temperature. CONSTITUTION:The title device possesses the light source part 1 which generates light which exposes a photosensitive body 7, the first temperature detecting means 10 which is closely positioned to the light source part 1 and detects the temperature of the light source part 1, and the second temperature detecting means 11 which detects the ambient environmental temperature. The excess temperature increase is prevented by the temperature ratio of the temperature of a thermister 11 to the temperature of a filter 8 in the light source part. At this point, the temperature (environmental temperature) of the other thermister, which is the second temperature detecting means 11, is subtracted from the temperature of the thermister, which is the first temperature detecting means 10, so as not to cause the environmental temperature change. Then, the temperature increase on the filter 8 surface is obtained from the temperature increase of the thermister 11, and the second thermister temperature (environmental temperature) is added again to the obtained value, and the correct temperature is obtained, and the superheated conditions are detected. Thus, the reliability is improved, and the safetiness is maintained.