CHARGED PARTICLE BEAM LITHOGRAPHY DEVICE
PURPOSE:To cut down the writing time by a method wherein an image of the first iris is formed on the second iris, another image of the second iris is formed on the third iris and then the other image of the third iris is formed on a target. CONSTITUTION:When an image 6a using the first iris 6 is ove...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
18.05.1989
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Edition | 4 |
Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE:To cut down the writing time by a method wherein an image of the first iris is formed on the second iris, another image of the second iris is formed on the third iris and then the other image of the third iris is formed on a target. CONSTITUTION:When an image 6a using the first iris 6 is overlapped with the second iris 10, an overlapped part 6b is formed. When the overlapped part 6b is further overlapped with the third iris 18, the other overlapped part 10b is formed. When the sizes and positions of said overlapped parts are varied, various L type movable forming beams 18 turned in four directions (0 deg., 90 deg., 180 deg., 270 deg.) can be formed furthermore, if the third iris 18 is not overlapped with the overlapped part 6b, the other rectangular movable forming beam 20 can be formed. When a figure, especially large L type figure is to be written using such L type movable forming beam 10, the figure can be written using the L type movable forming beam only one time to cut down the writing time. |
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Bibliography: | Application Number: JP19870283553 |