JP2985904B

PURPOSE:To correct nonuniformity in the illuminance of X rays exactly by measuring the intensity of an X-ray photoelectron at a plurality of points in an area of analysis by using a standard sample, and by determining correction data at each point from measured data by an operation of interpolation....

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Bibliographic Details
Main Author ZENITANI FUKUO
Format Patent
LanguageEnglish
Published 06.12.1999
Edition6
Subjects
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Summary:PURPOSE:To correct nonuniformity in the illuminance of X rays exactly by measuring the intensity of an X-ray photoelectron at a plurality of points in an area of analysis by using a standard sample, and by determining correction data at each point from measured data by an operation of interpolation. CONSTITUTION:A reference sample wherein an arbitrary element is distributed uniformly is set in an apparatus and an area of analysis is specified by inputting coordinate values (X0, Y0), (X1, Y0), (X0, Y1) and (X1, Y1) of four corners. Next, measured data are taken in sequentially from points (a), (b), (c) and (d) at the four corners of the specified area and stored in a memory. Then, a material to be analyzed is set and specification of the area of analysis is executed in the same way. This area needs to be located inside the foregoing area. When a measuring operation is started, the apparatus takes in measured data for analysis in respect to each point in the specified area of a sample surface and stores them in the memory. The measured data from the four corners regarding the reference sample are denoted by Ia, Ib, Ic and Id, the coordinates of an arbitrary point on the sample surface by (X, Y) and the measured data for analysis at this point of the sample to be measured by I, and correction data I (X, Y) for analysis are calculated by the equation.
Bibliography:Application Number: JP19910142435