JP2887281B

• Main Authors: WADA YASUYUKI, HISAOKA KATSUYUKI, TAGASHIRA AKIRA, KAMYAMA TSUTOMU, KOYAGI YASUYUKI
• Format: Patent
• Language: English
• Published: 26.04.1999
• Edition: 6
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE:To provide a proximity apparatus, which can detect the position deviation at the intended detecting position and can perform prealignment. CONSTITUTION:The detection of the position deviation of the edge of a substrate 1 with respect to a reference position is performed under the state, wherein the substrate is supported with a sucking and supporting part 7a of a substrate carrier 7 at an input position LP. The substrate, whose position-deviation detection is finished, is conveyed onto an exposure stage 41 with the substrate carrier 7. The exposure stage 1 waits at the position of an original point, which is aligned with the reference position. When the substrate 1 is carried in, the exposure stage 41 is displaced in the horizontal plane and lifted by the detected amount of the position deviation (the amount corresponding to the deviation amount with respect to the position of the original point of the exposure stage). The substrate 1 is received from the substrate carrier 7. Thereafter, the exposure stage 41 is returned to the position of the original point and further lifted. The stage 41 is made to approach to a mask, and prealignment is completed.