RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT

• Main Author: NGUYEN KHANHTIN
• Format: Patent
• Language: English; Japanese
• Published: 18.06.2024
• Subjects: ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; DYES; ELECTROGRAPHY; HETEROCYCLIC COMPOUNDS; HOLOGRAPHY; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PAINTS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES

To provide a resist composition which can achieve higher sensitivity when forming a resist pattern and enhance lithographic characteristics such as in-plane uniformity of pattern dimensions and fine resolution.SOLUTION: The present invention employs the resist composition containing: a base component whose solubility in a developer changes by the action of an acid; and a compound represented by general formula (d0). In the formula (d0), Rd represents a base-decomposable group; L03 represents a divalent linking group; Rl0 represents a cyclic organic group; L02 represents a divalent linking group; Rm1 represents a substituent; L01 represents a divalent linking group or a single bond; nd1 represents an integer of 1-4, nd2 represents an integer of 1-4, and nd3 represents an integer of 0-3, provided that 2≤nd1+nd2+nd3≤5; Mm+ represents an m-valent organic cation; and m represents an integer of 1 or more.SELECTED DRAWING: None 【課題】レジストパターンを形成する際に高感度化が図れ、かつ、パターン寸法の面内均一性及び微細解像性等のリソグラフィー特性を高められるレジスト組成物を提供する。【解決手段】本発明は、酸の作用により現像液に対する溶解性が変化する基材成分と、一般式（ｄ０）で表される化合物と、を含有するレジスト組成物を採用する。式（ｄ０）中、Ｒｄは塩基分解性基である。Ｌ０３は２価の連結基である。Ｒｌ０は環状の有機基である。Ｌ０２は２価の連結基である。Ｒｍ１は置換基である。Ｌ０１は２価の連結基又は単結合である。ｎｄ１は１～４の整数、ｎｄ２は１～４の整数、ｎｄ３は０～３の整数である。但し、２≦ｎｄ１＋ｎｄ２＋ｎｄ３≦５である。Ｍｍ＋はｍ価の有機カチオンを表す。ｍは１以上の整数である。［化１］TIFF2024081529000122.tif31170【選択図】なし