SUBSTRATE FOR MOUNTING SEMICONDUCTOR DEVICE

• Main Authors: ABE YUKARI, KATO OSAMU, NOMIYA SHUJI
• Format: Patent
• Language: English; Japanese
• Published: 10.05.2024
• Subjects: MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVINGMATERIAL; PERFORMING OPERATIONS; PUNCHING METAL; TRANSPORTING; WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS ORPROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL

To provide a technique that can manufacture a metallic press-worked product in which an area ratio of a flat surface of a main surface is high, by suppressing sagging.SOLUTION: A metallic press-worked product is constituted as a polyhedron comprising a pair of main surfaces and a plurality of side surfaces connecting the main surfaces to each other, where at least any surface of the plurality of side surfaces has a sheared surface, and a ratio of a flat surface, whose flatness is 10 μm or less, of at least either of the pair of main surfaces to areas of the main surface is 90% or higher.SELECTED DRAWING: Figure 1 【課題】ダレを抑制し、主面の平坦面積の割合が高い金属プレス加工品を製造できる技術を提供する。【解決手段】一対の主面と、それらの間をつなぐ複数の側面と、を備える多面体として構成された金属プレス加工品であって、複数の側面のうち少なくともいずれかの面は、せん断面を有し、一対の主面のうち少なくともいずれか一方の面は、主面の面積に対して、平面度が１０μｍ以下となる平坦面積の割合が９０％以上である、金属プレス加工品。【選択図】図１