POLYMER COMPOSITION WITH PHOTOACID GENERATORS AND PHOTORESIST

• Main Authors: MICHAEL THOMAS SHEEHAN, DAI QIU, ZHANG YONGQIANG, MURALI GANTH THEIVANAYAGAM
• Format: Patent
• Language: English; Japanese
• Published: 07.05.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

To provide a polymer composition with photoacid generators and photoresists.SOLUTION: In a first aspect, a polymer composition comprises 0.5 to 99 mol% of a hydroxy styrene repeating unit; 0.5 to 99 mol% of a repeating unit of a sulfonated photoacid generator; and 0.5 to 99 mol% of a repeating unit which is unstable to an acid. In a second aspect, a photoresist composition comprises the polymer composition of the first aspect.SELECTED DRAWING: None 【課題】 光酸発生剤を有するポリマー組成物及びフォトレジストを提供する。【解決手段】 第１の態様では、ポリマー組成物は、０．５～９９モル％のヒドロキシスチレン繰り返し単位と、０．５～９９モル％のスルホン化光酸発生剤繰り返し単位と、０．５～９９モル％の酸に不安定な繰り返し単位とを含む。第２の態様では、フォトレジスト組成物は第１の態様のポリマー組成物を含む。【選択図】 なし