POLYMER COMPOSITION WITH PHOTOACID GENERATORS AND PHOTORESIST

To provide a polymer composition with photoacid generators and photoresists.SOLUTION: In a first aspect, a polymer composition comprises 0.5 to 99 mol% of a hydroxy styrene repeating unit; 0.5 to 99 mol% of a repeating unit of a sulfonated photoacid generator; and 0.5 to 99 mol% of a repeating unit...

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Bibliographic Details
Main Authors MICHAEL THOMAS SHEEHAN, DAI QIU, ZHANG YONGQIANG, MURALI GANTH THEIVANAYAGAM
Format Patent
LanguageEnglish
Japanese
Published 07.05.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:To provide a polymer composition with photoacid generators and photoresists.SOLUTION: In a first aspect, a polymer composition comprises 0.5 to 99 mol% of a hydroxy styrene repeating unit; 0.5 to 99 mol% of a repeating unit of a sulfonated photoacid generator; and 0.5 to 99 mol% of a repeating unit which is unstable to an acid. In a second aspect, a photoresist composition comprises the polymer composition of the first aspect.SELECTED DRAWING: None 【課題】 光酸発生剤を有するポリマー組成物及びフォトレジストを提供する。【解決手段】 第１の態様では、ポリマー組成物は、０．５～９９モル％のヒドロキシスチレン繰り返し単位と、０．５～９９モル％のスルホン化光酸発生剤繰り返し単位と、０．５～９９モル％の酸に不安定な繰り返し単位とを含む。第２の態様では、フォトレジスト組成物は第１の態様のポリマー組成物を含む。【選択図】 なし
Bibliography:Application Number: JP20230180660