MASK ASSEMBLY AND ASSOCIATED METHODS

To provide a mask assembly and methods which overcome or mitigate a problem associated with the use of a pellicle in EUV lithography.SOLUTION: A method comprises the steps of: receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame; removing the...

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Main Authors DERK SERVATIUS GERTRUDA BROUNS, DE GRAAF DENNIS, JAMES NORMAN WILEY, PAUL JANSSEN, KRUIZINGA MATTHIAS, DANIEL ANDREW SMITH, ARNOUD WILLEM NOTENBOOM, BEATRIJS LOUISE MARIE-JOSEPH KATRIEN VERBRUGGE, ROBERTUS CORNELIS MARTINUS DE KRUIF
Format Patent
LanguageEnglish
Japanese
Published 10.04.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:To provide a mask assembly and methods which overcome or mitigate a problem associated with the use of a pellicle in EUV lithography.SOLUTION: A method comprises the steps of: receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame; removing the pellicle frame and EUV transparent pellicle from the mask; using an inspection tool to inspect the mask pattern on the mask; and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame.SELECTED DRAWING: Figure 9C 【課題】ＥＵＶリソグラフィにおけるペリクルの使用に関する問題を克服又は緩和するマスクアセンブリ及び方法を提供する。【解決手段】マスクと、ペリクルフレームにより保持された取り外し可能なＥＵＶ透明ペリクルと、を備えたマスクアセンブリを受け取るステップと、ペリクルフレーム及びＥＵＶ透明ペリクルをマスクから取り外すステップと、検査ツールを使用してマスク上のマスクパターンを検査するステップと、後でペリクルフレームにより保持されたＥＵＶ透明ペリクルをマスクに装着するステップと、を含む方法を提供する。【選択図】図９Ｃ
Bibliography:Application Number: JP20240017745