WAFER STORAGE CONTAINER CLEANING DEVICE

• Main Authors: MIYASAKO HISAAKI, ISHIHARA JUNJI, NISHIBE YUKINOBU
• Format: Patent
• Language: English; Japanese
• Published: 03.04.2024
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

To suppress cleaning liquid from entering the internal space of a door.SOLUTION: A wafer storage container cleaning device in which one side has a key hole that can be rotated with a latch key inserted to switch between locking and unlocking a wafer storage container body, and that cleans a door of the wafer storage container, which has a protrusion hole formed on the side surface through which the latch can protrude when locked includes a door holding portion that holds the door, a cleaning liquid nozzle that supplies cleaning liquid to the other side of the door, and a gas nozzle that generates gas flow that prevents the cleaning liquid from entering through the protrusion hole at least when the cleaning liquid is being supplied to the door from the cleaning liquid nozzle.SELECTED DRAWING: Figure 8 【課題】ドアの内部空間に洗浄液が入り込むことを抑制すること。【解決手段】実施形態に係るウェーハ収納容器洗浄装置は、一方面に、ラッチキーが挿入された状態で回転されることによりウェーハ収納容器本体とのロック／アンロックを切り替え可能なキー穴を有し、側面に前記ロック時にラッチが突出可能な突出用穴が形成されるウェーハ収納容器のドアを洗浄するウェーハ収納容器洗浄装置であって、前記ドアを保持するドア保持部と、前記ドアの他方面に対し、洗浄液を供給する洗浄液ノズルと、少なくとも前記洗浄液ノズルから前記洗浄液を前記ドアに供給しているときに、前記突出用穴からの前記洗浄液の侵入を阻害する気体の流れを生じさせる気体ノズルとを備える。【選択図】図８