DRAWING SYSTEM AND DRAWING METHOD

• Main Authors: WATANABE TAKATSUGU, NAKATSU SATOSHI, YASAKA SATOSHI
• Format: Patent
• Language: English; Japanese
• Published: 02.04.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CINEMATOGRAPHY; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRINTED CIRCUITS

To acquire, easily and in a short time, information useful for troubleshooting of a defective pattern on a substrate.SOLUTION: A drawing system 7 includes: a drawing unit 11 that performs drawing on a substrate; and a control unit 12 that makes the drawing unit 11 execute pattern drawing on a target substrate and drawing on a predetermined position on the target substrate of drawing related information related to the pattern drawing, by controlling the drawing unit 11. Thereby, information useful for troubleshooting of a defective pattern on a substrate can be obtained readily and in short time.SELECTED DRAWING: Figure 3 【課題】基板上のパターン不良のトラブルシューティングに有用な情報を、容易かつ短時間に取得する。【解決手段】描画システム７は、基板に描画を行う描画ユニット１１と、描画ユニット１１を制御することにより、対象基板へのパターンの描画と、当該パターンの描画に関連する描画関連情報の対象基板上の所定位置への描画とを描画ユニット１１に実行させる制御部１２とを備える。これにより、基板上のパターン不良のトラブルシューティングに有用な情報を、容易かつ短時間に取得することができる。【選択図】図３