TARGET OBJECT PROCESSOR, METHOD FOR PROCESSING TARGET OBJECT, AND METHOD FOR MANUFACTURING ORIGINAL EDITION

• Main Authors: MOTOKAWA KOJI, SAKURAI NORIKO, SAKURAI HIDEAKI
• Format: Patent
• Language: English; Japanese
• Published: 29.03.2024
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To reduce the roughness of the surface of a target object.SOLUTION: The method for processing a target object includes: a first step of conveying a target object into a processing room; a second step of generating at least one of first ions containing carbon and first plasma containing carbon and fo...