EXPOSURE METHOD AND EXPOSURE APPARATUS

• Main Author: NAKAI KAZUHIRO
• Format: Patent
• Language: English; Japanese
• Published: 29.03.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To improve a tact time of an exposure treatment by making it possible to expose during acceleration and deceleration in a relative movement between an exposure part and a substrate holding part.SOLUTION: The exposure method and exposure apparatus according to the present invention scan an incident position of the output light beam on a substrate by relatively moving an exposure part that outputs the light beam and a substrate holding part that holds the substrate, and based on the generated signal accompanying the relative movement, the relative movement speed between the exposure part and the substrate holding part is determined, and the light beam is made incident on the substrate to perform exposure while changing the light intensity of the light beam in multiple stages at a predetermined control cycle. The control period and the maximum amount of light beam are changed according to the determined relative movement speed.SELECTED DRAWING: Figure 11 【課題】露光部と基板保持部との相対移動における加速および減速の期間についても露光を可能とし、これにより露光処理のタクトタイムを向上させる。【解決手段】本発明に係る露光方法および露光装置は、光ビームを出力する露光部と基板を保持する基板保持部とを相対移動させることで基板に対する出力光ビームの入射位置を走査し、相対移動に伴って発生する信号に基づき、露光部と基板保持部との相対移動速度を求め、光ビームの光量を所定の制御周期で多段階に変化させながら光ビームを基板に入射させて露光を行う。求められた相対移動速度に応じて、制御周期および光ビームの最大光量が変更される。【選択図】図１１