MEMORY DEVICE
To improve reliability of a memory device.SOLUTION: A memory device comprises: a plurality of insulator layers which are aligned to be spaced away from one another in a first direction; a plurality of conductor layers which are aligned to be spaced away from one another in the first direction via th...
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Main Author | |
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Format | Patent |
Language | English Japanese |
Published |
27.03.2024
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Subjects | |
Online Access | Get full text |
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Summary: | To improve reliability of a memory device.SOLUTION: A memory device comprises: a plurality of insulator layers which are aligned to be spaced away from one another in a first direction; a plurality of conductor layers which are aligned to be spaced away from one another in the first direction via the plurality of insulator layers; and a memory pillar which extends in the first direction in a manner intersecting the plurality of conductor layers. The plurality of conductor layers include a first conductor layer which has a first portion and a second portion aligned in the first direction at a boundary with the memory pillar. With respect to the second portion, the first portion retreats in a second direction which intersects the first direction, and in which a memory pillar diameter increases. The plurality of insulator layers include: a first insulator layer which is provided on a surface of the first conductor layer on the first portion side; and a second insulator layer which is provided on a surface of the first conductor layer on the second portion side, and which is thinner than the first insulator layer in the first direction.SELECTED DRAWING: Figure 7
【課題】メモリデバイスの信頼性を向上させる。【解決手段】一実施形態のメモリデバイスは、第1方向に互いに離れて並ぶ複数の絶縁体層と、複数の絶縁体層を介して第1方向に互いに離れて並ぶ複数の導電体層と、複数の導電体層と交差するように第1方向に延びるメモリピラーと、を備える。複数の導電体層は、メモリピラーとの境界で第1方向に並ぶ第1部分及び第2部分を有する第1導電体層を含む。第1部分は、第2部分に対して、第1方向と交差しかつメモリピラーの径が増加する第2方向に後退する。複数の絶縁体層は、第1導電体層の第1部分側の面上に設けられる第1絶縁体層と、第1導電体層の第2部分側の面上に設けられ、第1方向に第1絶縁体層より薄い第2絶縁体層と、を含む。【選択図】図7 |
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Bibliography: | Application Number: JP20220146416 |