BEAM DETECTOR, MULTI-CHARGED PARTICLE BEAM IRRADIATION DEVICE, AND METHOD FOR ADJUSTING BEAM DETECTOR

To align holes of a two-stage aperture with high precision.SOLUTION: A beam detector has a first aperture substrate with a first passage hole smaller than the inter-beam pitch of the multiple charged particle beams, a second aperture substrate with a second passage hole through which one detection t...

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Bibliographic Details
Main Authors AKENO MASANOBU, SATO YASUHISA
Format Patent
LanguageEnglish
Japanese
Published 07.03.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:To align holes of a two-stage aperture with high precision.SOLUTION: A beam detector has a first aperture substrate with a first passage hole smaller than the inter-beam pitch of the multiple charged particle beams, a second aperture substrate with a second passage hole through which one detection target beam that has passed through the first passage hole can pass, and a sensor detecting a beam current of the detection target beam that has passed through the second passage hole. The second aperture substrate is transparent to light and includes a conductive material.SELECTED DRAWING: Figure 1 【課題】２段のアパーチャの孔を高精度に位置合わせする。【解決手段】ビーム検出器は、マルチ荷電粒子ビームのビーム間ピッチよりも小さい第１通過孔が形成された第１アパーチャ基板と、前記第１通過孔を通過した１本の検出対象ビームが通過可能な第２通過孔が形成された第２アパーチャ基板と、前記第２通過孔を通過した前記検出対象ビームのビーム電流を検出するセンサと、を備える。前記第２アパーチャ基板は、光に対して透過性を有し、導電性の材料を含む。【選択図】図１
Bibliography:Application Number: JP20220133449