SEMICONDUCTOR DEVICE

To achieve high reliability by giving stabilized electrical characteristics to a semiconductor device using an oxide semiconductor.SOLUTION: A semiconductor device has an insulating film, a first metal oxide film on the insulating film in contact therewith, an oxide semiconductor film partially in c...

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Bibliographic Details
Main Author YAMAZAKI SHUNPEI
Format Patent
LanguageEnglish
Japanese
Published 28.02.2024
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Summary:To achieve high reliability by giving stabilized electrical characteristics to a semiconductor device using an oxide semiconductor.SOLUTION: A semiconductor device has an insulating film, a first metal oxide film on the insulating film in contact therewith, an oxide semiconductor film partially in contact with the first metal oxide film, a source electrode and a drain electrode for connection electrically with the oxide semiconductor film, a second metal oxide film partially in contact with the oxide semiconductor film, a gate insulator film on the second metal oxide film in contact therewith, and a gate electrode on the gate insulator film.SELECTED DRAWING: Figure 1 【課題】酸化物半導体を用いた半導体装置に安定した電気的特性を付与し、高信頼性化することを目的の一とする。【解決手段】半導体装置が、絶縁膜と、絶縁膜上において該絶縁膜と接する第1の金属酸化物膜と、第1の金属酸化物膜と一部が接する酸化物半導体膜と、酸化物半導体膜と電気的に接続するソース電極およびドレイン電極と、酸化物半導体膜と一部が接する第2の金属酸化物膜と、第2の金属酸化物膜上において該第2の金属酸化物膜と接するゲート絶縁膜と、ゲート絶縁膜上のゲート電極と、を有する。【選択図】図1
Bibliography:Application Number: JP20240000075