METHOD FOR MANUFACTURING REFLECTIVE MASK, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK

• Main Author: WATANABE GENTA
• Format: Patent
• Language: English; Japanese
• Published: 31.01.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

To provide a method for manufacturing a reflective mask in which an increase of manufacturing process is suppressed.SOLUTION: A method for manufacturing a reflective mask 20 includes: preparing a reflective mask blank including a substrate 11, a multilayer film 12 laminated on one side of the substrate 11, and a protective film 13 laminated on the multilayer film 12; forming a resist pattern 14b having an opening 14a on the exposed surface of the protective film 13; etching a region exposed from the opening 14a of the protective film 13; and forming a mixed layer 15 containing a main material of the protective film 13 and a material constituting the film located closest to the protective film among the films constituting the multilayer film 12 in a region that overlaps on the opening 14a in a plan view of the multilayer film 12 as a byproduct, and with the mixed layer 15 as a mask, the multilayer film 12 is etched.SELECTED DRAWING: Figure 2 【課題】製造工程が多くなることが抑制された反射型マスクの製造方法を提供する。【解決手段】反射型マスクの製造方法は、基板１１、基板１１の一方の面に積層された多層膜１２、及び多層膜１２に積層された保護膜１３、を備えた反射型マスクブランクを準備し、保護膜１３の露出面に開口部１４ａを有するレジストパターン１４ｂを形成し、保護膜１３のうち開口部１４ａから露出する領域をエッチングし且つ多層膜１２の平面視で開口部１４ａに重なる領域に保護膜１３の主材料と多層膜１２を構成する膜のうち最も保護膜寄りに位置する膜を構成する材料とを含む混合層１５を副生成物として形成し、混合層１５をマスクとして、多層膜１２をエッチングする、反射型マスク２０の製造方法。【選択図】図２