PLASMA PROCESSING METHOD AND PLASMA PROCESSING SYSTEM

To provide a technology for suppressing particles within a chamber.SOLUTION: A plasma processing method is provided that is performed in a plasma processing device having a chamber. This method includes a step (a) of forming a carbon-containing film on the outer peripheral edge of a substrate, and a...

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Bibliographic Details
Main Authors ORUI TAKATOSHI, TAKAHASHI ATSUSHI, SUDA RYUTARO
Format Patent
LanguageEnglish
Japanese
Published 25.01.2024
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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