POLYMER, RESIST COMPOSITION, METHOD FOR MANUFACTURING PATTERNED SUBSTRATE, AS WELL AS, (METH)ACRYLIC ACID ESTER AND MANUFACTURING METHOD THEREOF

• Main Authors: MUKAI KAZUAKI, SAKUMA SATOSHI, JO TAKESHI, KAMON YOSHIHIRO, ANZAI RYUICHI
• Format: Patent
• Language: English; Japanese
• Published: 09.01.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

To provide a polymer excellent in developer dissolubility, a resist composition containing the polymer, and a method for manufacturing a substrate on which a pattern is formed with the resist composition.SOLUTION: A polymer containing a structural unit (1) based on a monomer represented by formula (1) and having a content of 35 mol% or less of a structural unit based on a monomer having a polycyclic structure. In formula (1), R1 represents a hydrogen atom or a methyl group; A1 represents a linking group containing an ester bond or a single bond, provided that A1 does not have a tertiary carbon atom; Z1 represents an atomic group that forms a sulfur-containing cyclic hydrocarbon group having 3 to 6 carbon atoms, including the carbon atom bonded with A1 and -SO2-.SELECTED DRAWING: None 【課題】現像液溶解性に優れる重合体、前記重合体を含むレジスト組成物、および前記レジスト組成物を用いたパターンが形成された基板の製造方法を提供すること。【解決手段】式（１）で表される単量体に基づく構成単位（１）を含み、多環構造を有する単量体に基づく構成単位の含有量が３５モル％以下である、重合体。式（１）中、Ｒ１は水素原子又はメチル基を表す；Ａ１はエステル結合を含む連結基又は単結合を表す、ただし、Ａ１は第３級炭素原子を有さない；Ｚ１は、Ａ１と結合している炭素原子と－ＳＯ２－とを含めて炭素数３～６の含硫黄環式炭化水素基を形成する原子団を表す。TIFF2024001025000017.tif50170【選択図】なし