DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD

• Main Authors: SEKI TAKATERU, KOBAYASHI YASUHIKO, FUJIOKA TAKAHIRO, IMAIZUMI TAKAMASA
• Format: Patent
• Language: English; Japanese
• Published: 05.01.2024
• Subjects: CALCULATING; COMPUTING; COUNTING; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PHYSICS; TESTING

To provide a defect inspection device and a defect inspection method with improved inspection determination accuracy.SOLUTION: A defect inspection method includes: an image acquisition step in which a defect inspection device changes relative posture of an inspected object and an imaging unit, captures images for each relative posture, and obtains multiple images; a feature acquisition step of scanning each of the multiple images to acquire specific features as first features; a waveform data acquisition step of acquiring first waveform data in which the first features are arranged in order of change in relative posture; and a defect determination step for determining defects according to the first waveform data.SELECTED DRAWING: Figure 1 【課題】 検査の判定精度を向上した欠陥検査装置および欠陥検査方法を提供することにある。【解決手段】 欠陥検査方法は、欠陥検査装置が、被検査物と撮像部の相対姿勢を変化させて、相対姿勢毎に撮像を行い、複数の画像を取得する画像取得ステップと、複数の画像をそれぞれ走査して得られる特定の特徴を第１特徴量として取得する特徴量取得ステップと、第１特徴量を相対姿勢の変化の順に並べた第１波形データを取得する波形データ取得ステップと、第１波形データに応じて欠陥の判定を行う欠陥判定ステップを有する。【選択図】 図１