MULTI-CHARGED PARTICLE BEAM DRAWING DEVICE AND MULTI-CHARGED PARTICLE BEAM DRAWING METHOD

• Main Authors: KATO YASUO, KAWANA RYO
• Format: Patent
• Language: English; Japanese
• Published: 14.12.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

To provide a multi-beam drawing device capable of avoiding data processing for defective beam correction not being able to keep up with the drawing processing speed.SOLUTION: A multi-beam drawing device includes a molded aperture array substrate, a defect correction data creation unit that creates defect correction data that defines a dose modulation rate to compensate by distributing the dose at the position of a defective beam, which is always OFF among the multi-charged particle beams, to one or more other pixels by using a dose distribution in which each position of a unit area on the sample surface corresponding to the irradiation area of the entire multi-beam is defined by a uniform dose regardless of the drawing pattern, a dose map creation unit that calculates an individual dose amount according to the drawing pattern for each drawing pattern, a dose correction unit that reads defect correction data from the storage device for each drawing pattern and obtains a dose amount by correcting the individual dose amount at each position on the sample, and a drawing mechanism that draws a drawing pattern on the sample using a corrected dose amount.SELECTED DRAWING: Figure 1 【課題】描画処理速度に欠陥ビーム補正のデータ処理が間に合わなくなることを回避可能なマルチビーム描画装置を提供する。【解決手段】マルチビーム描画装置は、成形アパーチャアレイ基板と、描画パターンに関わらずマルチビーム全体での照射領域に対応する試料面上の単位領域の各位置が一様のドーズ量で定義されるドーズ分布を用いて、マルチ荷電粒子ビームのうち常時ビームＯＦＦとなる欠陥ビームが担当する位置のドーズ量を他の１つ以上の画素へと分配することによって補正するための、ドーズ変調率を定義する欠陥補正データを作成する欠陥補正データ作成部と、描画パターン毎に描画パターンに応じた個別のドーズ量を演算するドーズマップ作成部と、描画パターン毎に記憶装置から欠陥補正データを読み出し、試料上の各位置の個別のドーズ量を補正したドーズ量を得るドーズ補正部と、補正したドーズ量で試料に描画パターンを描画する描画機構と、を備える。【選択図】図１