DEFECT INSPECTION APPARATUS

• Main Authors: ARIMA EIJI, HAYASHI TOMOAKI, KAWAMURA TOMOHITO
• Format: Patent
• Language: English; Japanese
• Published: 12.12.2023
• Subjects: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PHYSICS; TESTING

To provide a defect inspection apparatus capable of simultaneously inspecting the height and pitch of a small step defect and a waviness defect on a sample surface with high sensitivity and high throughput.SOLUTION: A defect inspection apparatus according to the present invention is equipped with a first sensor for detecting a differential interference signal and a second sensor for detecting a pupil plane image of an irradiating optical system, and detects a step defect using the differential interference signal and detects a waviness defect using signals detected by the first sensor and the second sensor.SELECTED DRAWING: Figure 1 【課題】試料表面の低段差欠陥とうねり欠陥の高さ・ピッチを同時に高感度・高スループットで検査することができる欠陥検査装置を提供する。【解決手段】本発明に係る欠陥検査装置は、微分干渉信号を検出する第１センサと照射光学系の瞳面像を検出する第２センサを備え、前記微分干渉信号を用いて段差欠陥を検出し、前記第１センサおよび前記第２センサが検出した信号を用いてうねり欠陥を検出する。【選択図】図１