CIRCUIT USING THREE-DIMENSIONAL WIRING, AND MANUFACTURE METHOD THEREFOR

To suppress a defective electric connection from being caused and contact resistance from increasing between surface-side wiring and three-dimensional wiring of a film substrate.SOLUTION: In a pixel circuit 1 which drives a switching TFT 50, a driving TFT 51 and a light-emitting element 57 formed on...

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Bibliographic Details
Main Authors NAKADA MITSURU, MIYAKAWA MIKIJI, TSUJI HIROSHI
Format Patent
LanguageEnglish
Japanese
Published 07.12.2023
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Summary:To suppress a defective electric connection from being caused and contact resistance from increasing between surface-side wiring and three-dimensional wiring of a film substrate.SOLUTION: In a pixel circuit 1 which drives a switching TFT 50, a driving TFT 51 and a light-emitting element 57 formed on a top surface side of a film substrate 101 using three-dimensional wiring 63 connecting a reverse-surface electrode 110 as reverse surface-side wiring of the film substrate 101 and a signal line 10 as top surface-side wiring, a scanning line 53, a ground line 54, and a power supply line 55, a contact electrode 11 which partially expands the width of the signal line 10 is formed halfway on the signal line 10 as an electrode for connecting the three-dimensional wiring 63. Consequently, the contact electrode 11 that the signal line 10 comprises can make the signal line 10 partially wider in width than a through hole 62 where the three-dimensional wiring 63 is formed.SELECTED DRAWING: Figure 2 【課題】フィルム基板の表面側配線と立体配線との間で、電気的な接続不良の発生及びコンタクト抵抗の増加を抑制する。【解決手段】フィルム基板101の裏面側配線である裏面電極110と表面側配線である信号線10、走査線53、グランド線54及び電源線55とを接続する立体配線63を用いて、フィルム基板101の表面側に形成されたスイッチング用TFT50、ドライビング用TFT51及び発光素子57を駆動する画素回路1において、信号線10の途中に、立体配線63を接続するための電極であって、信号線10の幅を部分的に広げるコンタクト電極11を形成する。これにより、信号線10に備えたコンタクト電極11において、信号線10の幅を、立体配線63が形成された貫通孔62の幅よりも部分的に広げることができる。【選択図】図2
Bibliography:Application Number: JP20220086641