MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
To provide a transistor having smaller variation, higher reliability, and stable electric characteristic despite of having a minute structure, and increase the performance and reliability also in a semiconductor device including the transistor.SOLUTION: An insulator is formed on a substrate, an open...
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Main Author | |
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Format | Patent |
Language | English Japanese |
Published |
01.12.2023
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Subjects | |
Online Access | Get full text |
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