MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE

To provide a transistor having smaller variation, higher reliability, and stable electric characteristic despite of having a minute structure, and increase the performance and reliability also in a semiconductor device including the transistor.SOLUTION: An insulator is formed on a substrate, an open...

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Bibliographic Details
Main Author KAKEHATA TETSUYA
Format Patent
LanguageEnglish
Japanese
Published 01.12.2023
Subjects
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