COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME

• Main Authors: SUZANNE M COLEY, CUI LI, CEN YINJIE, PAKU JON GUN, JAMES F CAMERON, LEE CHOONG-BONG, EMAD AQAD, CONNOR A HOELZEL
• Format: Patent
• Language: English; Japanese
• Published: 01.12.2023
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

To provide a compound and a photoresist composition including the same.SOLUTION: The present invention provides a compound represented by formula (1) (where X represents an r-valent group, R1's each independently represent an organic group with an acid-labile group, m represents an integer of 1 or greater, k represents an integer of 1-5, and r represents an integer of 2-10). The compound is not a polymer. Ar1, L1, L2, R2 and R3 are as defined in the specifications. 【課題】 化合物及びそれを含むフォトレジスト組成物を提供する。【解決手段】 式（１）：【化１】JPEG2023171299000050.jpg33170（式中、Ｘは、ｒ価の基であり、各Ｒ１は、独立して、酸不安定基を含む有機基であり、ｍは、１以上の整数であり、ｋは、１～５の整数であり、及びｒは、２～１０の整数である）によって表される化合物であって、ポリマーではなく、Ａｒ１、Ｌ１、Ｌ２、Ｒ２及びＲ３は、本明細書で定義される通りである、化合物。