POLYMERIC MATERIAL, SELF-ASSEMBLED MONOLAYER, SELF-ASSEMBLED MONOLAYER PRODUCTION METHOD, PATTERN, AND PATTERN FORMATION METHOD

• Main Authors: MIYAJIMA TORU, SAITO SHUNSUKE, FUKUNAGA NORIYA, SAWABE TOMOMI, HIRAHARA KAZUHIRO
• Format: Patent
• Language: English; Japanese
• Published: 22.11.2023
• Subjects: CHEMISTRY; COMPOSITIONS BASED THEREON; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP

To provide a polymeric material capable of forming a self-assembled monolayer which has a small half-pitch (hp) of the formed pattern, uniformity and film strength, and is excellent in etch resistance in dry etching.SOLUTION: The polymeric material contains a multi-block copolymer formed by linking...