LASER PROCESSING DEVICE
To provide a laser processing device which can reduce sputters adhering to an emission unit.SOLUTION: A laser processing device 100 comprises: an emission unit 1 which emits a laser beam L in a first direction toward a workpiece W; a first aperture 2 which has a first hole 22 through which the laser...
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Main Author | |
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Format | Patent |
Language | English Japanese |
Published |
10.11.2023
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a laser processing device which can reduce sputters adhering to an emission unit.SOLUTION: A laser processing device 100 comprises: an emission unit 1 which emits a laser beam L in a first direction toward a workpiece W; a first aperture 2 which has a first hole 22 through which the laser beam L passes; a releasing unit 5 which releases a gas flow F intersecting the laser beam L on the emission unit 1 side of the first aperture 2; and a collection unit 6 which collects sputters S scattered from an irradiation point P of the laser beam L in the workpiece W. The releasing unit 5 is arranged on the opposite side of the collection unit 6 with the laser beam L held therebetween when viewed from the first direction.SELECTED DRAWING: Figure 1
【課題】本発明の目的は、出射部へ付着するスパッタを低減することが可能なレーザ加工装置を提供することである。【解決手段】レーザ加工装置100は、ワークWに向けて第1方向にレーザビームLを出射する出射部1と、レーザビームLが通過する第1孔22を有する第1アパーチャ2と、第1アパーチャ2の出射部1側においてレーザビームLと交差する気体流Fを放出する放出部5と、ワークWにおけるレーザビームLの照射点Pから飛散するスパッタSを捕集するための捕集部6と、を備える。放出部5は、第1方向から視て、レーザビームLを挟んで捕集部6の反対側に配置される。【選択図】図1 |
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Bibliography: | Application Number: JP20220074659 |