VAPOR DEPOSITION MASK

• Main Authors: IGAWA MITSUGI, YANAGISAWA AKIRA, YAMADA TETSUYUKI, IWAHASHI NAOYA
• Format: Patent
• Language: English; Japanese
• Published: 10.11.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To provide a vapor deposition mask that has few damages.SOLUTION: A vapor deposition mask includes: a thin film-like mask body; a holding frame provided around the mask body; and a connection member for connecting the mask body to the holding frame. The mask body includes: a first region including a first pattern part; a second region surrounding the first region and including a second pattern part; and a third region surrounding the second region. The first region and the second region are disposed within a reference frame. The vapor deposition mask is isolated by the first region and the second pattern part of the mask body. In the vapor deposition mask, the second region comes into externally contact with an outer shape of the first region of the mask body.SELECTED DRAWING: Figure 1 【課題】破損の少ない蒸着マスクを提供することを課題の一つとする。【解決手段】蒸着マスクは、薄膜状のマスク本体と、マスク本体の周囲に設けられた保持枠と、マスク本体と保持枠とを接続する接続部材と、を有し、マスク本体は、第１パターン部を有する第１領域と、第１領域を囲み第２パターン部を有する第２領域と、第２領域を囲む第３領域と、を有し、第１領域および第２領域は基準枠内に配置される。さらに、蒸着マスクは、マスク本体の第１領域と第２パターン部が離隔する。また、蒸着マスクは、第２領域は、マスク本体の第１領域の外形に外接する。【選択図】図１