COMPOUND

• Main Authors: WATANABE TAKESHI, DANIEL PAUL SANDERS, SAWAMURA TAKASHI, OGIWARA TSUTOMU, ARAIDA KEISUKE, GREGORY BREYTA, RUDY J WOJTECKI, NAGAI YOKO, ALEXANDER EDWARD HESS, TACHIBANA SEIICHIRO
• Format: Patent
• Language: English; Japanese
• Published: 08.11.2023
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; CHEMISTRY; HETEROCYCLIC COMPOUNDS; METALLURGY; ORGANIC CHEMISTRY

To provide a compound which is cured even under film deposition conditions in an inert gas and can form an organic underlayer film not only excellent in heat resistance and properties of filling and planarizing a pattern formed on a substrate but also good in dry etching resistance during substrate processing.SOLUTION: The compound is represented by the following formula (1-1) (where AR1 and AR2 each represent an aromatic ring or an aromatic ring containing one or more of a nitrogen atom and a sulfur atom; two AR1's, AR1 and AR2, or two AR2's may be linked; AR3 represents a benzene ring, a naphthalene ring, a thiophene ring, a pyridine ring or a diazine ring; A represents an organic group; B represents an anionic leaving group; Y represents a divalent organic group; p is 1 or 2; q is 1 or 2; r is 0 or 1; s is 2-4; when s=2, Z represents a single bond, a divalent atom or a divalent organic group; and when s=3 or 4, Z represents a trivalent or tetravalent atom or organic group).SELECTED DRAWING: Figure 1 【課題】不活性ガス中での成膜条件でも硬化し、耐熱性や、基板上に形成されたパターンの埋め込みや平坦化特性に優れるだけでなく、基板加工時のドライエッチング耐性も良好な有機下層膜を形成できる化合物の提供。【解決手段】下式（１－１）で示される化合物。TIFF2023162191000071.tif18103（式中、ＡＲ１、ＡＲ２は芳香環又は窒素原子、硫黄原子のうち１個以上を含む芳香環を示し、２つのＡＲ１、ＡＲ１とＡＲ２、２つのＡＲ２が連結してもよい。ＡＲ３はベンゼン環、ナフタレン環、チオフェン環、ピリジン環、又はジアジン環である。Ａは有機基、Ｂはアニオン性脱離基、Ｙは２価の有機基、ｐは１または２、ｑは１または２、ｒは０または１、ｓは２～４である。ｓ＝２のとき、Ｚは単結合、２価の原子、又は２価の有機基であり、ｓ＝３または４のとき、Ｚは３価または４価の、原子または有機基である。）【選択図】図１