ELECTRON BEAM INSPECTION DEVICE USING RETARDING VOLTAGE
PURPOSE: To provide an electron beam inspection device using a retarding voltage, that stably applies a desired retarding voltage to a front surface in a sample in which a pattern is formed on an insulation substrate such as a photo mask to acquire a stable and high resolution image.CONSTITUTION: An...
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Format | Patent |
Language | English Japanese |
Published |
31.10.2023
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Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE: To provide an electron beam inspection device using a retarding voltage, that stably applies a desired retarding voltage to a front surface in a sample in which a pattern is formed on an insulation substrate such as a photo mask to acquire a stable and high resolution image.CONSTITUTION: An electron beam inspection device of a retarding voltage, comprises: an electronic gun; an objective lens; a deflection system that performs a secondary scanning of an electron beam obtained by being thinly narrowed with the objective lens to a front surface of the sample; a retarding voltage applying device that applies the retarding voltage to the sample; an inspection device that inspects a potential or a capacity of the front surface corresponding to the movement of the sample, and is provided on a tip end of the objective lens so as to be opposite to the sample; and a correction device that corrects the retarding voltage so as to correct the potential of the front surface of the sample to a constant on the basis of the potential or the capacitance of the front surface of the sample corresponding to the movement of the sample detected by the inspection device.SELECTED DRAWING: Figure 1
【目的】本発明は、リターディング電圧を用いた電子線検査装置に関し、フォトマスク等の絶縁基板上にパターンが形成されているサンプルにおいて、表面に安定的に所望のリターディング電圧を印加し、高分解能かつ安定な画像を取得することを目的とする。【構成】電子銃と、対物レンズと、対物レンズで細く絞られた電子ビームを前記サンプルの表面に2次元走査する偏向系と、サンプルにリターディング電圧を印加するリターディング電圧印加装置と、サンプルの移動に対応した表面の電位あるいは容量を検出する、対物レンズの先端に、該サンプルに対向して設けた検出装置と、 検出装置で検出されたサンプルの移動に対応したサンプルの表面の電位あるいは容量をもとに、該サンプルの表面の電位を一定に補正するようにリターディング電圧を補正する補正装置とを備える。【選択図】 図1 |
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Bibliography: | Application Number: JP20230136886 |