PIEZOELECTRIC ELEMENT, MICROPHONE AND METHOD OF MANUFACTURING PIEZOELECTRIC ELEMENT
To provide a piezoelectric element, a microphone, and a method of manufacturing the piezoelectric element capable of reducing an increase in man-hours.SOLUTION: A piezoelectric element includes: a piezoelectric film 40 arranged on a support 10; an electric film 50 laminated on the piezoelectric film...
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Main Authors | , , , , |
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Format | Patent |
Language | English Japanese |
Published |
23.10.2023
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a piezoelectric element, a microphone, and a method of manufacturing the piezoelectric element capable of reducing an increase in man-hours.SOLUTION: A piezoelectric element includes: a piezoelectric film 40 arranged on a support 10; an electric film 50 laminated on the piezoelectric film 40; through electrodes 61a, 62a formed inside hole parts 61b, 62b penetrating the piezoelectric film 40; and an interlayer insulating film 82 which is formed on the wall surfaces of the holes 61a and 62a and on the top of the piezoelectric film 40, and insulates the piezoelectric film 40 from the through electrodes 61b, 62b. A vibrating part 20 includes a piezoelectric film 40 and an electrode film 50, and has a support region 21a supported by the support 10 and a floating region 21b floating from the support 10. The floating region 21b has a plurality of vibration regions partitioned by slits 30, and in the slits 30, an additional thin film 81 made of the same material as the interlayer insulating film 82 is arranged.SELECTED DRAWING: Figure 2
【課題】工数の増加を低減できる圧電素子、マイクロフォン、および圧電素子の製造方法を提供する。【解決手段】支持体10に配置された圧電膜40と、圧電膜40に積層された電極膜50と、圧電膜40を貫通する孔部61a、62aの内部に形成された貫通電極61b、62bと、孔部61a、62aの壁面および圧電膜40の上部に形成され、圧電膜40と貫通電極61b、62bとを絶縁させる層間絶縁膜82と、を備え、振動部20は、圧電膜40および電極膜50を含み、支持体10に支持される支持領域21aと、支持体10から浮遊している浮遊領域21bとを有し、浮遊領域21bは、スリット30によって区画された複数の振動領域を有し、スリット30には、層間絶縁膜82と同じ材料で構成された付加薄膜81が配置されている。【選択図】図2 |
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Bibliography: | Application Number: JP20220065336 |