SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

• Main Authors: ONZUKA KEIJI, TSURUSAKI KOTARO, KANEKAWA KOZO, KAI YOSHIHIRO
• Format: Patent
• Language: English; Japanese
• Published: 20.10.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

To provide a technique capable of suppressing stagnation of a substrate flow and improving throughput.SOLUTION: A substrate processing system comprises: a carrying-in unit into which a cassette housing a plurality of substrates is carried; a batch processing unit which collectively processes a lot including the plurality of substrates; a sheet processing unit which processes one by one the substrates of the lot; a carrying-out unit to which the cassette housing the plurality of substrate is carried out; an interface unit which transfers the substrates between the batch processing unit and the sheet processing unit; and a second interface unit which transfers the substrates between the carrying-in unit and the batch processing unit. The carrying-in unit and the carrying-out unit are separately provided. The second interface unit, the batch processing unit, the interface unit, and the sheet processing unit are arranged in this order between the carrying-in unit and the carrying-out unit along a substrate conveyance direction.SELECTED DRAWING: Figure 10 【課題】基板の流れが停滞するのを抑制でき、スループットを向上できる、技術を提供する。【解決手段】複数枚の基板を収容したカセットが搬入される搬入部と、複数枚の基板を含むロットを、一括で処理するバッチ処理部と、前記ロットの前記基板を１枚ずつ処理する枚葉処理部と、複数枚の前記基板を収容したカセットが搬出される搬出部と、前記バッチ処理部と前記枚葉処理部との間で前記基板を受け渡すインターフェース部と、前記搬入部と前記バッチ処理部との間で前記基板を受け渡す第２インターフェース部と、を有し、前記搬入部と前記搬出部は別々に設けられ、前記搬入部と前記搬出部の間に、前記基板の搬送方向に沿って、前記第２インターフェース部と、前記バッチ処理部と、前記インターフェース部と、前記枚葉処理部と、がこの順番で並ぶ。【選択図】図１０