PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE

To provide a photosensitive resin composition capable of manufacturing a highly reliable electronic device by heating and curing the composition at approximately 170°C to form a cured film.SOLUTION: There is provided a photosensitive resin composition which comprises a polyamide resin and/or a polyi...

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Bibliographic Details
Main Authors TANAKA YUMA, KAWASAKI RITSUYA, KAWANAMI TAKUSHI
Format Patent
LanguageEnglish
Japanese
Published 20.10.2023
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Summary:To provide a photosensitive resin composition capable of manufacturing a highly reliable electronic device by heating and curing the composition at approximately 170°C to form a cured film.SOLUTION: There is provided a photosensitive resin composition which comprises a polyamide resin and/or a polyimide resin, wherein a cured film obtained by heating the photosensitive resin composition at 170°C for 2 hours has a storage elastic modulus E'220 at 220°C of 0.5 to 3.0 GPa by measuring dynamic viscoelasticity under the following conditions. [Conditions] Frequency: 1 Hz, Temperature: 30 to 300°C, Temperature rising rate: 5°C/min, Measurement mode: Tensile mode.SELECTED DRAWING: Figure 1 【課題】170℃程度の加熱により硬化させて硬化膜とすることにより、信頼性の高い電子デバイスを製造可能な感光性樹脂組成物を提供することである。【解決手段】 ポリアミド樹脂および/またはポリイミド樹脂を含む感光性樹脂組成物であって、感光性樹脂組成物を170℃で2時間加熱して得られた硬化膜を、以下条件で動的粘弾性測定をしたときの、220℃での貯蔵弾性率E'220が0.5~3.0GPaである、感光性樹脂組成物。[条件]周波数:1Hz温度:30~300℃昇温速度:5℃/分測定モード:引張りモード【選択図】図1
Bibliography:Application Number: JP20230127695