METHOD FOR ETCHING GLASS BASE MATERIAL

• Main Authors: TANABE MASAHIRO, IRISAWA MUNETOSHI
• Format: Patent
• Language: English; Japanese
• Published: 16.10.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; CINEMATOGRAPHY; ELECTROGRAPHY; GLASS; HOLOGRAPHY; JOINING GLASS TO GLASS OR OTHER MATERIALS; MATERIALS THEREFOR; METALLURGY; MINERAL OR SLAG WOOL; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS

To provide a method for etching a glass which enables simple formation of a fine pattern excellent in a surface shape.SOLUTION: A method for etching a glass base material includes at least a step (I) of forming a metal thin film layer on a glass base material, a step (II) of forming a resin mask layer on the metal thin film layer, a step (III) of etching the metal thin film layer through the resin mask layer, and forming a metal mask layer, and a step (IV) of etching the exposed glass base material part, in this order, wherein the resin mask layer is a resin mask layer obtained by exposing, developing and patterning a photosensitive resin layer containing at least (A) acid-modified epoxy (meth)acrylate, (B) a photopolymerization initiator and (C) a blocked isocyanate compound, and the method include a step of heating the resin mask layer before the step (III) or the step (IV).SELECTED DRAWING: None 【課題】本発明の課題は、簡便に、表面形状に優れた微細なパターンを形成できるガラスのエッチング方法を提供することである。【解決手段】（Ｉ）ガラス基材上に金属薄膜層を形成する工程、（ＩＩ）金属薄膜層上に樹脂マスク層を形成する工程、（ＩＩＩ）樹脂マスク層を介して金属薄膜層をエッチングして金属マスク層を形成する工程、および（ＩＶ）露出したガラス基材部をエッチングする工程、を少なくともこの順に具備し、該樹脂マスク層が、少なくとも（Ａ）酸変性エポキシ（メタ）アクリレート、（Ｂ）光重合開始剤、および（Ｃ）ブロック化イソシアネート化合物を含有する感光性樹脂層を露光、現像してパターニングした樹脂マスク層であり、前記工程（ＩＩＩ）または前記工程（ＩＶ）の前に該樹脂マスク層を加熱処理する工程を具備する。【選択図】なし