ELECTRODE FOR ELECTROSTATIC CHUCK AND FORMATION METHOD FOR THE SAME

• Main Authors: TESHIMA YUTA, KUROKI AKIMASA, OHASHI NARIAKI, UENO SUKETSUGU
• Format: Patent
• Language: English; Japanese
• Published: 16.10.2023
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERATION; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

To securely stabilize the electrical resistance of the entire electrode and to obtain a uniform attraction force by not adding insulating additives on an electrode for an electrostatic chuck and by eliminating the vacancy of an electrode directly below an opening portion.SOLUTION: An electrode of a dense electrostatic chuck is formed by the steps for forming an electrode on one side of a dielectric layer of an electrostatic chuck by a printing method, overlaying a base substrate having an opening portion so that the electrode is on the inside, pressurizing and joining the overlaid dielectric layer and the base substrate, infiltrating a low-melting-point metal or an alloy of the same to an electrode part exposed from the opening portion.SELECTED DRAWING: Figure 3 【課題】静電チャック用の電極に、絶縁性の添加材を加えないことと、開口部直下の電極の空孔を無くすことで、電極全体の電気抵抗を確実に安定させ、均一な吸着力を得ることを課題とする。【解決手段】静電チャックの誘電体層の片面に、印刷法により電極を形成する工程と、前記電極が内側になるように、開口部をもつベース基板を重ね合わせる工程と、重ね合わせた誘電体層とベース基板を加圧接合する工程と開口部から露出した電極部には低融点金属もしくはその合金を溶浸させる工程により、緻密な静電チャックの電極を形成する。【選択図】 図３