PREDICTION SUPPORT SYSTEM, PREDICTION SUPPORT METHOD, AND PREDICTION SUPPORT PROGRAM

To provide a prediction support system, a prediction support method, and a prediction support program for supporting treatment by the application of a radiation ray by efficiently predicting a radiation ray irradiation state.SOLUTION: A support device 20 includes a control unit 21 for predicting an...

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Bibliographic Details
Main Authors NISHIO TEIJI, MAEKAWA HIDEMASA, IWABUCHI KOHEI
Format Patent
LanguageEnglish
Japanese
Published 13.10.2023
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Summary:To provide a prediction support system, a prediction support method, and a prediction support program for supporting treatment by the application of a radiation ray by efficiently predicting a radiation ray irradiation state.SOLUTION: A support device 20 includes a control unit 21 for predicting an irradiation state by a radiation irradiation device 10. The control unit 21 generates a first voxel on electron density distribution in the body of a reference phase, generates a second voxel on dose distribution, and generates a plurality of rays that connect a virtual focal point disposed on an irradiation device 10 side and a plurality of end points disposed on a projection surface in an irradiation direction with a linear line. The control unit 21 calculates accumulation relative electron density in association with the first voxel for each ray, and calculates a dose of the second voxel corresponding to the first voxel. The control unit 21 generates depth dose distribution information that associates the accumulation relative electron density with the dose of the second voxel, and predicts the dose distribution using the depth dose distribution information when the electron density distribution of a prediction phase is acquired.SELECTED DRAWING: Figure 1 【課題】放射線の照射状態を効率的に予測して、放射線の照射による治療を支援するための予測支援システム、予測支援方法及び予測支援プログラムを提供する。【解決手段】支援装置20は、放射線の照射装置10による照射状態を予測する制御部21を備える。制御部21が、基準フェーズの体内の電子密度分布について第1ボクセルを生成し、線量分布について第2ボクセルを生成し、照射装置10側に配置された仮想焦点と、照射方向の投影面に配置された複数の終点とを直線で結んだ複数のレイを生成する。制御部21は、レイ毎に、第1ボクセルに対応させて累積相対電子密度を算出し、第1ボクセルに対応する第2ボクセルの線量を算出する。制御部21は、累積相対電子密度と、前記第2ボクセルの線量とを対応させた深度線量分布情報を生成し、予測フェーズの電子密度分布を取得した場合、深度線量分布情報を用いて、線量分布を予測する。【選択図】図1
Bibliography:Application Number: JP20220054983