SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

• Main Author: OBARA TAKANORI
• Format: Patent
• Language: English; Japanese
• Published: 06.10.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

To provide a technique that enables a reduction in an operation of a substrate processing apparatus and shortening of a time taken by substrate processing.SOLUTION: A substrate processing apparatus comprises: a holding part for holding a substrate; a liquid supply part for supplying, to a main surfa...