SUBSTRATE PROCESSING APPARATUS

• Main Authors: MURAMOTO RYO, NEMOTO SHUHEI, SHOJI KAZUHIRO
• Format: Patent
• Language: English; Japanese
• Published: 05.10.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

To stably process a substrate at a low cost by suppressing a bounce droplet, in a substrate processing apparatus that processes the substrate by supplying a processing liquid to the rotated substrate.SOLUTION: This invention provides a substrate processing apparatus including: a substrate holding part that is rotatably provided around a rotational shaft extended in a vertical direction while sucking and holding a lower surface center part of a substrate; a rotational mechanism that outputs a rotational driving force for rotating the substrate holding part; a processing mechanism that processes the substrate by supplying a processing liquid to the substrate held by the substrate holding part; and a rotational cup part that is rotatably provided around the rotational shaft while surrounding an outer periphery of the substrate to be rotated, and captures a droplet of the processing liquid scattered from the substrate. The rotational mechanism further includes a dynamic transmission part that transmits one part of a rotational driving force as a cup driving force to a cup part to simultaneously rotate the substrate holding part and the rotational cup part by the rotational driving force.SELECTED DRAWING: Figure 2 【課題】回転している基板に処理液を供給して基板を処理する基板処理装置において、低コストで、跳ね返り液滴を抑制して基板を安定して処理する低コストで、跳ね返り液滴を抑制して基板を安定して処理する。【解決手段】この発明は、基板の下面中央部を吸着して保持しながら鉛直方向に延びる回転軸まわりに回転可能に設けられる基板保持部と、基板保持部を回転させるための回転駆動力を出力する回転機構と、基板保持部に保持された基板に処理液を供給して基板を処理する処理機構と、回転する基板の外周を囲みながら回転軸まわりに回転可能に設けられ、基板から飛散する処理液の液滴を捕集する回転カップ部と、を備えている。回転機構は、回転駆動力の一部をカップ駆動力としてカップ部に伝達する動力伝達部をさらに有し、回転駆動力によって基板保持部および回転カップ部を同時に回転させる。【選択図】図２