METHOD FOR PRODUCING POROUS SILICON MATERIAL, POROUS SILICON MATERIAL, AND POWER STORAGE DEVICE
To provide a porous silicon material in which, in materials containing Si, deterioration in charge/discharge characteristics is further suppressed.SOLUTION: A method for producing porous silicon material of the present disclosure includes a precursor step of melting and rapidly cooling and solidifyi...
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Main Authors | , , , , , , , , |
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Format | Patent |
Language | English Japanese |
Published |
05.10.2023
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Subjects | |
Online Access | Get full text |
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Summary: | To provide a porous silicon material in which, in materials containing Si, deterioration in charge/discharge characteristics is further suppressed.SOLUTION: A method for producing porous silicon material of the present disclosure includes a precursor step of melting and rapidly cooling and solidifying a Si, Al and Nb-containing raw material to yield a silicon alloy precursor, and a porosification step of removing Al component contained in silicon alloy to yield a porous silicon material.SELECTED DRAWING: None
【課題】Siを含む材料において、充放電特性の低下をより抑制する。【解決手段】本開示の多孔質シリコン材料の製造方法は、SiとAlとNbとを含む原料を溶融し急冷凝固させシリコン合金の前駆体を得る前駆体工程と、シリコン合金に含まれるAl成分を除去して多孔質シリコン材料を得る多孔化工程と、を含む。【選択図】なし |
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Bibliography: | Application Number: JP20220046387 |