ELECTROSTATIC CHUCK DEVICE

To provide an electrostatic chuck device including a ceramic film with high withstand voltage and high adhesion.SOLUTION: The electrostatic chuck device includes a base 110, an adhesive layer 310, an insulating organic film 320, an electrode 130, an adhesive layer 410, an insulating organic film 420...

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Bibliographic Details
Main Authors ANDO DAIGO, UEMURA TAKATO
Format Patent
LanguageEnglish
Japanese
Published 14.09.2023
Subjects
BASIC ELECTRIC ELEMENTS
CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GENERATION
SEMICONDUCTOR DEVICES
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Summary:To provide an electrostatic chuck device including a ceramic film with high withstand voltage and high adhesion.SOLUTION: The electrostatic chuck device includes a base 110, an adhesive layer 310, an insulating organic film 320, an electrode 130, an adhesive layer 410, an insulating organic film 420, a ceramic layer 120 containing a resin binder, and a ceramic film 140, which are stacked on one another. The ceramic film 140 contains ceramic particles and a metal oxide. At least a portion of the ceramic particles are bonded to each other via the metal oxide.SELECTED DRAWING: Figure 5 【課題】 耐電圧が高く、かつ密着性が高いセラミック膜を備える静電チャック装置を提供する。【解決手段】 基台１１０、接着層３１０、絶縁性有機フィルム３２０、電極１３０、接着層４１０、絶縁性有機フィルム４２０、樹脂バインダーを含有するセラミック層１２０及びセラミック膜１４０が積層した静電チャック装置で、前記セラミック膜１４０が、セラミック粒子と、金属酸化物と、を含有し、前記セラミック粒子間の少なくとも一部が前記金属酸化物を介して結着している静電チャック装置。【選択図】 図５
Bibliography:Application Number: JP20220032232